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2010 – 2019
- 2018
[j5]Bipul C. Paul, Ajey P. Jacob
, William Taylor, Randy W. Mann, Joseph Versaggi, Edward J. Nowak, Lars W. Liebmann:
A Retrospective View on the Technology Evolution to Support Low Power Mobile Application. J. Low Power Electron. 14(3): 374-392 (2018)- 2015
- [c13]David Z. Pan, Lars Liebmann, Bei Yu, Xiaoqing Xu, Yibo Lin:
Pushing multiple patterning in sub-10nm: are we ready? DAC 2015: 197:1-197:6 - [c12]Wei Ye, Bei Yu, David Z. Pan, Yongchan Ban, Lars Liebmann:
Standard Cell Layout Regularity and Pin Access Optimization Considering Middle-of-Line. ACM Great Lakes Symposium on VLSI 2015: 289-294 - 2014
- [c11]Kaushik Vaidyanathan, Lars Liebmann, Andrzej J. Strojwas, Larry T. Pileggi:
Sub-20 nm design technology co-optimization for standard cell logic. ICCAD 2014: 124-131 - [c10]Lars W. Liebmann, Rasit Onur Topaloglu:
Design and technology co-optimization near single-digit nodes. ICCAD 2014: 582-585 - 2013
- [j4]Lars Liebmann, J. Andres Torres:
A Designer's Guide to Subresolution Lithography: Enabling the Impossible to Get to the 14-nm Node [Tutorial]. IEEE Des. Test 30(3): 70-92 (2013) - [j3]Rani S. Ghaida, Kanak B. Agarwal, Sani R. Nassif, Xin Yuan, Lars Liebmann, Puneet Gupta:
Layout Decomposition and Legalization for Double-Patterning Technology. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 32(2): 202-215 (2013) - 2012
- [c9]Rani S. Ghaida, Kanak B. Agarwal, Sani R. Nassif, Xin Yuan, Lars W. Liebmann, Puneet Gupta:
O(n) layout-coloring for multiple-patterning lithography and conflict-removal using compaction. ICICDT 2012: 1-4 - 2011
- [c8]Rani S. Ghaida, Kanak B. Agarwal, Sani R. Nassif, Xin Yuan, Lars Liebmann, Puneet Gupta:
A framework for double patterning-enabled design. ICCAD 2011: 14-20 - [c7]Shayak Banerjee, Kanak B. Agarwal, Sani R. Nassif, James A. Culp, Lars Liebmann, Michael Orshansky:
Coupling timing objectives with optical proximity correction for improved timing yield. ISQED 2011: 97-102 - 2010
- [j2]Tejas Jhaveri, Vyacheslav Rovner, Lars Liebmann, Larry T. Pileggi, Andrzej J. Strojwas, Jason Hibbeler:
Co-Optimization of Circuits, Layout and Lithography for Predictive Technology Scaling Beyond Gratings. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 29(4): 509-527 (2010)
2000 – 2009
- 2008
- [c6]Shayak Banerjee, Praveen Elakkumanan, Lars Liebmann, Michael Orshansky:
Electrically driven optical proximity correction based on linear programming. ICCAD 2008: 473-479 - 2007
- [c5]Louis Scheffer, Lars Liebmann, Riko Rakojcic, David White:
Rules vs tools: what's the right way to address IC manufacturing complexity? ISPD 2007: 75-76 - 2003
- [c4]Lars Liebmann:
Layout impact of resolution enhancement techniques: impediment or opportunity? ISPD 2003: 110-117 - 2002
- [c3]Mark A. Lavin, Lars Liebmann:
CAD computation for manufacturability: can we save VLSI technology from itself? ICCAD 2002: 424-431 - 2001
- [j1]Lars Liebmann, Scott M. Mansfield, Alfred K. Wong, Mark A. Lavin, William C. Leipold, Timothy G. Dunham:
TCAD development for lithography resolution enhancement. IBM J. Res. Dev. 45(5): 651-666 (2001) - [c2]Lars Liebmann, Jennifer Lund, Fook-Luen Heng, Ioana Graur:
Enabling Alternating Phase Shifted Mask Designs for a Full Logic Gate Level: Design Rules and Design Rule Checking. DAC 2001: 79-84 - [c1]Fook-Luen Heng, Lars Liebmann, Jennifer Lund:
Application of automated design migration to alternating phase shift mask design. ISPD 2001: 38-43
Coauthor Index
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