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2020 – today
- 2025
[c5]Yusheng Bian, Abdelsalam Aboketaf, Won Suk Lee, Sujith Chandran, Edgar Huante-Ceron, Arman Najafi, Ana Villafranca, Hatef Shiran, Judson Holt, Francis Afzal, Kevin K. Dezfulian, Michelle Zhang, Brian Popielarski, Ming Gong, Javier Ayala, Patrick Snow, Helen Wong, Qidi Liu, Mrunal Shah, Felix Beaudoin, Frank Pavlik, Crystal Hedges, Frieder Baumann, Michal Rakowski, Takako Hirokawa, Andy Stricker, Oscar Restrepo, Brett Yatzor, Massimo Sorbara, Yahui Xiao, Kyle Murray, Mohammad Karimi, Akram Hajebifard, Prova Christina Gomes, Richard Grzybowski, John Martinho, Yu Zhang, Amit Gupta, Hanyi Ding, Kate McLean, Teodor Stanev, Paul Webster-Pact, Ah Fatt Tong, Prashanth Prasad Raghavendra, Mini Modh Ghosal, Mohamed Gheith, Ian Stobert, Ryan Sweeney, Minghui Zhang, Jonathan Rullan, Feng Chen, Arunima Dasgupta, Jae Rascoe, Andrea Paganini, Alban Zaka, Xinggong Wan, Asli Sahin, Janet Tinkler, Bob Mulfinger, Scott Hildreth, George Gifford, Rainer Gehres, Ryan Sporer, Rick Carter, Vikas Gupta, Ken Giewont, Isabelle Ferain, Ted Letavic:
Monolithically Integrated High-Performance Ge-on-Si PIN Photodetectors with Nearly 60 GHz EO Bandwidth, 0.95 A/W Responsivity, <30 nA Dark Current and -36 dB Optical Return Loss Enabled by Ge Shape Optimization. OFC 2025: 1-3- [c4]Yusheng Bian, Takako Hirokawa, Yarong Lin, Zahidur Chowdhury, Arpan Dasgupta, Abdelsalam Aboketaf, Won Suk Lee, Francis Afzal, Sujith Chandran, Kevin K. Dezfulian, Arman Najafi, Ming Gong, Qidi Liu, Brian Popielarski, Jae Kyu Cho, Farid Barakat, Jason Kim, Michelle Zhang, Keith Donegan, Thomas Houghton, Karen Nummy, John Garant, Ravi Srivastava, Dewei Xu, Petar Ivanov Todorov, Michal Rakowski, Massimo Sorbara, Yahui Xiao, Shenghua Song, Helen Wong, Mohamed Gheith, Ian Stobert, Mini Modh Ghosal, Kate McLean, Ryan Gallagher, Norman Robson, Ian Melville, Asli Sahin, Janet Tinkler, Bob Mulfinger, George Gifford, Ryan Sporer, Rick Carter, Vikas Gupta, Ken Giewont, Isabelle Ferain, Ted Letavic:
High-power, low-loss, fabrication tolerant multi-tip SiN edge coupler in 300mm monolithic SiPh foundry technology. OFC 2025: 1-3 - 2022
- [c3]Nishtha S. Gaul, Akhilesh Jaiswal, Hongsik Yoon, Taeyoung Lee
, Kazutaka Yamane, Joseph Versaggi, Rick Carter, Bipul C. Paul:
A Physics based MTJ Compact Model for State-of-the-Art and Emerging STT-MRAM Failure Analysis and Yield Enhancement. IMW 2022: 1-4 - 2020
- [j2]Randy W. Mann, Meixiong Zhao, Oh Sung Kwon, Xi Cao, Sanjay Parihar, Muhammed Ahosan Ul Karim, Jack M. Higman, Joseph Versaggi, Rick Carter:
Bias-Dependent Variation in FinFET SRAM. IEEE Trans. Very Large Scale Integr. Syst. 28(5): 1341-1344 (2020)
2010 – 2019
- 2019
- [j1]Randy W. Mann, Meixiong Zhao, Sanjay Parihar, Qun Gao, Ankur Arya, Carl Radens, Shesh Mani Pandey, Joseph Versaggi, Jack M. Higman, Rick Carter:
An Extrinsic Device and Leakage Mechanism in Advanced Bulk FinFET SRAM. IEEE Trans. Very Large Scale Integr. Syst. 27(8): 1819-1827 (2019) - 2017
- [c2]D. H. Triyoso, G. R. Mulfinger, K. Hempel, H. Tao, F. Koehler, L. Kang, A. Kumar, T. McArdle, J. Holt, A. L. Child, S. Straub, F. Ludwig, Z. Chen, J. Kluth, Rick Carter:
Characterization of atomic layer deposited low-k spacer for FDSOI high-k metal gate transistor. ICICDT 2017: 1-4 - 2016
- [c1]D. H. Triyoso, Rick Carter, J. Kluth, K. Hempel, M. Gribelyuk, L. Kang, A. Kumar, Bob Mulfinger, P. Javorka, K. Punchihewa, A. Child, T. McArdle, J. Holt, S. Straub, R. Sporer, P. Chen:
Extending HKMG scaling on CMOS with FDSOI: Advantages and integration challenges. ICICDT 2016: 1-4
Coauthor Index
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