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2020 – today
- 2023
[c7]Edward Van Brunt, Daniel J. Lichtenwalner, J. H. Park, Satyaki Ganguly, J. W. McPherson:
Lifetime Modeling of the 4H-SiC MOS Interface in the HTRB Condition Under the Influence of Screw Dislocations. IRPS 2023: 1-4
2010 – 2019
- 2019
- [c6]Evelyn Landman, Shai Cohen, Noam Brousard, Raanan Gewirtzman, Inbar Weintrob, Eyal Fayne, Yahel David, Yuval Bonen, Omer Niv, Shai Tzroia, Alex Burlak, J. W. McPherson:
Degradation Monitoring - from a Vision to Reality. IRPS 2019: 1-4 - 2018
- [c5]J. W. McPherson:
Brief history of JEDEC qualification standards for silicon technology and their applicability(?) to WBG semiconductors. IRPS 2018: 3 - 2015
- [c4]J. W. McPherson:
Understanding the underlying degradation physics for proper time-to-failure distribution selection. IRPS 2015: 1 - 2012
- [j2]J. W. McPherson:
Time dependent dielectric breakdown physics - Models revisited. Microelectron. Reliab. 52(9-10): 1753-1760 (2012)
2000 – 2009
- 2007
- [c3]J. W. McPherson:
Reliability Trends with Advanced CMOS Scaling and The Implications for Design. CICC 2007: 405-412 - 2006
- [c2]J. W. McPherson:
Reliability challenges for 45nm and beyond. DAC 2006: 176-181 - 2004
- [j1]J. W. McPherson:
Mie-Grüneisen Analysis of the Molecular Bonding States in Silica Which Impact Time-Dependent Dielectric Breakdown. Microelectron. Reliab. 44(9-11): 1491-1496 (2004) - 2001
- [c1]J. W. McPherson:
Scaling-Induced Reductions in CMOS Reliability Margins and the Escalating Need for Increased Design-In Reliability Efforts. ISQED 2001: 123-130
Coauthor Index
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