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2020 – today
- 2021
[c5]Shih-che Hung, Shih-Chang Chen, Pei-Shan Chien, Yu-Sheng Cho, Yung-Huei Lee, Wei-Shuo Hung:
Time-Efficient Characterization of Time-Dependent Gate Oxide Breakdwon Using Tunable Ramp Voltage Stress (TRVS) Method for Automotive Applications. IRPS 2021: 1-6- [c4]Yung-Huei Lee, P. J. Liao, Vincent Hou, Dawei Heh, Chih-Hung Nien, Wen-Hsien Kuo, Gary T. Chen, Shao-Ming Yu, Yu-Sheng Chen, Jau-Yi Wu, Xinyu Bao, Carlos H. Diaz
:
Composition Segregation of Ge-Rich GST and Its Effect on Reliability. IRPS 2021: 1-6
2010 – 2019
- 2019
- [c3]Kaustubh Joshi, Yung-Huei Lee, Yu-Cheng Yao, Shu-Wen Chang, Siao-Syong Bian, P. J. Liao, Jiaw-Ren Shih, Min-Jan Chen:
A Statistical Learning Model for Accurate Prediction of Time-Dependent Dielectric Degradation for Low Failure Rates. IRPS 2019: 1-6 - 2018
- [j3]Subhadeep Mukhopadhyay, Yung-Huei Lee, Jen-Hao Lee:
Time-zero-variability and BTI impact on advanced FinFET device and circuit reliability. Microelectron. Reliab. 81: 226-231 (2018) - [c2]Kaustubh Joshi, Shu-Wen Chang, D. S. Huang, P. J. Liao, Yung-Huei Lee:
Study of dynamic TDDB in scaled FinFET technologies. IRPS 2018: 5-1
2000 – 2009
- 2006
- [c1]Yin-Lung Ryan Lu, Yung-Huei Lee, William J. Mcmahon, Tze-Ching Fung:
Robust Inductor Design for RF Circuits. CICC 2006: 571-574 - 2005
- [j2]Yung-Huei Lee, Steve Jacobs, Stefan Stadler, Neal R. Mielke, Ramez Nachman:
The impact of PMOST bias-temperature degradation on logic circuit reliability performance. Microelectron. Reliab. 45(1): 107-114 (2005) - 2001
- [j1]Yung-Huei Lee, Tom Linton, Ken Wu, Neal R. Mielke:
Effect of trench edge on pMOSFET reliability. Microelectron. Reliab. 41(5): 689-696 (2001)
Coauthor Index
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