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"Impact of Al-, Ni-, TiN-, and Mo-metal gates on MOCVD-grown ..."
Stephan Abermann et al. (2007)
- Stephan Abermann
, J. K. Efavi, G. Sjöblom, Max Christian Lemme
, Jörgen Olsson
, Emmerich Bertagnolli:
Impact of Al-, Ni-, TiN-, and Mo-metal gates on MOCVD-grown HfO2 and ZrO2 high-kappa dielectrics. Microelectron. Reliab. 47(4-5): 536-539 (2007)
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