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G. Sjöblom

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2007
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Stephan Abermann, J. K. Efavi, G. Sjöblom, Max Christian Lemme, Jörgen Olsson, Emmerich Bertagnolli:
Impact of Al-, Ni-, TiN-, and Mo-metal gates on MOCVD-grown HfO₂ and ZrO₂ high-kappa dielectrics. Microelectron. Reliab. 47(4-5): 536-539 (2007)

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