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Wing L. Lai

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Journal Articles

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2003
[j4]
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Ernest Y. Wu, Jordi Suñé, Wing L. Lai, Alex Vayshenker, Edward J. Nowak, David L. Harmon:
Critical reliability challenges in scaling SiO₂-based dielectric to its limit. Microelectron. Reliab. 43(8): 1175-1184 (2003)
[j3]
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Jordi Suñé, Ernest Y. Wu, David Jiménez, Wing L. Lai:
Statistics of soft and hard breakdown in thin SiO₂ gate oxides. Microelectron. Reliab. 43(8): 1185-1192 (2003)
2002
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Ernest Y. Wu, Edward J. Nowak, Alex Vayshenker, Wing L. Lai, David L. Harmon:
CMOS scaling beyond the 100-nm node with silicon-dioxide-based gate dielectrics. IBM J. Res. Dev. 46(2-3): 287-298 (2002)
[j1]
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Fen Chen, Rolf-Peter Vollertsen, Baozhen Li, Dave Harmon, Wing L. Lai:
A new empirical extrapolation method for time-dependent dielectric breakdown reliability projections of thin SiO₂ and nitride-oxide dielectrics. Microelectron. Reliab. 42(3): 335-341 (2002)

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