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Q. Peter He
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- affiliation: Auburn University, Department of Chemical Engineering, Auburn, AL, USA
- affiliation: Tuskegee University, Department of Chemical Engineering, Tuskegee, AL, USA
- affiliation (PhD 2005): University of Texas at Austin, TX, USA
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2020 – today
- 2022
- [c16]Kiumars Badr, Q. Peter He, Jin Wang:
Understanding the evolution of interspecies metabolic interactions using dynamic genome-scale metabolic modeling*. ACC 2022: 450-455 - [c15]Alexander J. Summers, Houshang Yin, Ralf D. Fischer, Barton C. Prorok, Xiaoyuan Lou, Q. Peter He:
Improving Linear Separability of Pulse Wave Laser Additive Manufacturing Classifiers with Rational Feature Engineering and Selection *. ACC 2022: 2592-2597 - [c14]Jisung Jang, Di Tian, Q. Peter He:
Model-based Irrigation Control using Model Predictive Control and DSSAT Crop Simulator. ACC 2022: 5314-5319 - 2021
- [j7]Kerul Suthar, Q. Peter He:
Multiclass moisture classification in woodchips using IIoT Wi-Fi and machine learning techniques. Comput. Chem. Eng. 154: 107445 (2021) - 2020
- [j6]Devarshi Shah, Jin Wang, Q. Peter He:
Feature engineering in big data analytics for IoT-enabled smart manufacturing - Comparison between deep learning and statistical learning. Comput. Chem. Eng. 141: 106970 (2020) - [c13]Jangwon Lee, Jesus Flores-Cerrillo, Jin Wang, Q. Peter He:
A Variable Selection Method for Improving Variable Selection Consistency and Soft Sensor Performance. ACC 2020: 725-730 - [c12]Kerul Suthar, Jin Wang, Zhihua Jiang, Q. Peter He:
Using Channel State Information for Estimating Moisture Content in Woodchips via 5 GHz Wi-Fi. ACC 2020: 2784-2789
2010 – 2019
- 2019
- [j5]Jangwon Lee, Q. Peter He:
Understanding the effect of specialization on hospital performance through knowledge-guided machine learning. Comput. Chem. Eng. 125: 490-498 (2019) - [j4]Q. Peter He, Jin Wang, Devarshi Shah:
Feature space monitoring for smart manufacturing via statistics pattern analysis. Comput. Chem. Eng. 126: 321-331 (2019) - [j3]Kerul Suthar, Devarshi Shah, Jin Wang, Q. Peter He:
Next-generation virtual metrology for semiconductor manufacturing: A feature-based framework. Comput. Chem. Eng. 127: 140-149 (2019) - [j2]Feifan Cheng, Q. Peter He, Jinsong Zhao:
A novel process monitoring approach based on variational recurrent autoencoder. Comput. Chem. Eng. 129 (2019) - 2017
- [c11]Kyle A. Stone, Devarshi Shah, Q. Peter He, Jin Wang:
A new application of data-driven soft sensor: Estimating individual biomass in mixed cultures. ACC 2017: 561-566 - [c10]Q. Peter He, Jin Wang:
Statistical process monitoring in the era of smart manufacturing. ACC 2017: 4797-4802 - 2013
- [c9]Meng Liang, Q. Peter He, Thomas W. Jeffries, Jin Wang:
Elucidating xylose metabolism of scheffersomyces stipitis by integrating principal component analysis with flux balance analysis. ACC 2013: 3777-3782 - [c8]Q. Peter He, Jin Wang:
Quantification of valve stiction based on a semi-physical model. ACC 2013: 4362-4367 - [c7]Jin Wang, Q. Peter He, Thomas F. Edgar:
Improved state estimation for high-mix semiconductor manufacturing. ACC 2013: 6649-6654 - 2012
- [c6]Q. Peter He, Jin Wang, Hector E. Gilicia, John D. Stuber, Bhalinder S. Gill:
Statistics pattern analysis based virtual metrology for plasma etch processes. ACC 2012: 4897-4902 - 2010
- [c5]Q. Peter He, Jin Wang:
Comparison of a new spectrum alignment algorithm with other methods. ACC 2010: 1260-1265 - [c4]Jin Wang, Q. Peter He, Thomas F. Edgar:
Control performance assessment and diagnosis for semiconductor processes. ACC 2010: 7004-7009
2000 – 2009
- 2008
- [c3]Q. Peter He, Jin Wang:
Principal component based k-nearest-neighbor rule for semiconductor process fault detection. ACC 2008: 1606-1611 - [c2]Jin Wang, Q. Peter He:
EWMA run-to-run controllers with gain updating: Stability and sensitivity analysis. ACC 2008: 2872-2877 - 2007
- [j1]Christopher A. Bode, Jin Wang, Q. Peter He, Thomas F. Edgar:
Run-to-run control and state estimation in high-mix semiconductor manufacturing. Annu. Rev. Control. 31(2): 241-253 (2007) - [c1]Jin Wang, Q. Peter He, Thomas F. Edgar:
A General Framework for State Estimation in High-Mix Semiconductor Manufacturing. ACC 2007: 3636-3641
Coauthor Index
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