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"Layout Decomposition for Triple Patterning Lithography."

Bei Yu et al. (2015)

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DOI: 10.1109/TCAD.2014.2387840

access: closed

type: Journal Article

metadata version: 2020-09-24

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Bei Yu, Kun Yuan, Duo Ding, David Z. Pan:
Layout Decomposition for Triple Patterning Lithography. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 34(3): 433-446 (2015)

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