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"Effects of stair case gate bias stress in IGZO/Al2O3 ..."

Marco Buonomo et al. (2018)

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DOI: 10.1016/J.MICROREL.2018.06.056

access: closed

type: Journal Article

metadata version: 2022-12-07

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  - https://dblp.org/rec/journals/mr/BuonomoWLCC18
Marco Buonomo, Nicola Wrachien, Nicolò Lago, Giuseppe Cantarella, Andrea Cester:
Effects of stair case gate bias stress in IGZO/Al₂O₃ flexible TFTs. Microelectron. Reliab. 88-90: 882-886 (2018)

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