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"Thickness dependent dielectric breakdown of PECVD low-k carbon doped ..."
H. Zhou, F. G. Shi, B. Zhao (2003)
- H. Zhou, F. G. Shi, B. Zhao:
Thickness dependent dielectric breakdown of PECVD low-k carbon doped silicon dioxide dielectric thin films: modeling and experiments. Microelectron. J. 34(4): 259-264 (2003)
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