"Stitch aware detailed placement for multiple E-beam lithography."

Yibo Lin et al. (2017)

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DOI: 10.1016/J.VLSI.2017.02.004

access: closed

type: Journal Article

metadata version: 2020-02-20

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Yibo Lin, Bei Yu, Yi Zou, Zhuo Li, Charles J. Alpert, David Z. Pan:
Stitch aware detailed placement for multiple E-beam lithography. Integr. 58: 47-54 (2017)

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