"A 0.11 mum CMOS technology featuring copper and very low k interconnects ..."

Yoshihiro Takao et al. (2002)

> Home

Details and statistics

DOI: 10.1016/S0026-2714(01)00233-5

access: closed

type: Journal Article

metadata version: 2020-02-22

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/mr/TakaoKMKYYSNAK02
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/mr/TakaoKMKYYSNAK02
Yoshihiro Takao, Hiroshi Kudo, Junichi Mitani, Yoshiyuki Kotani, Satoshi Yamaguchi, Keizaburo Yoshie, Kazuo Sukegawa, Nobuhisa Naori, Satoru Asai, Michiari Kawano:
A 0.11 mum CMOS technology featuring copper and very low k interconnects with high performance and reliability. Microelectron. Reliab. 42(1): 15-25 (2002)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.