"Physics based modeling of bimodal electromigration failure distributions ..."

Sarath Mohanachandran Nair et al. (2020)

> Home

Details and statistics

DOI: 10.1109/IRPS45951.2020.9128313

access: closed

type: Conference or Workshop Paper

metadata version: 2021-10-14

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - conf/irps/NairBTZCGKC20
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/irps/NairBTZCGKC20
Sarath Mohanachandran Nair, Rajendra Bishnoi, Mehdi B. Tahoori, Houman Zahedmanesh, Kristof Croes, Kevin Garello, Gouri Sankar Kar, Francky Catthoor:
Physics based modeling of bimodal electromigration failure distributions and variation analysis for VLSI interconnects. IRPS 2020: 1-5

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.