"Comprehensive Analysis of Data-Retention and Endurance Trade-Off of 40nm ..."

Shouhei Fukuyama et al. (2019)

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DOI: 10.1109/IRPS.2019.8720436

access: closed

type: Conference or Workshop Paper

metadata version: 2019-05-31

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Shouhei Fukuyama, Atsuna Hayakawa, Ryutaro Yasuhara, Shinpei Matsuda, Hiroshi Kinoshita, Ken Takeuchi:
Comprehensive Analysis of Data-Retention and Endurance Trade-Off of 40nm TaOx-based ReRAM. IRPS 2019: 1-6

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