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"Design of a force-decoupled compound parallel alignment stage for ..."

Xiantao Sun et al. (2014)

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DOI: 10.1109/ICRA.2014.6907184

access: closed

type: Conference or Workshop Paper

metadata version: 2017-09-24

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Xiantao Sun, Weihai Chen, Rui Zhou, Wenjie Chen, Jianbin Zhang:
Design of a force-decoupled compound parallel alignment stage for high-resolution imprint lithography. ICRA 2014: 2345-2350

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