"Overlapping-aware throughput-driven stencil planning for E-beam lithography."

Jian Kuang, Evangeline F. Y. Young (2014)

Details and statistics

DOI: 10.1109/ICCAD.2014.7001360

access: closed

type: Conference or Workshop Paper

metadata version: 2017-05-24

a service of  Schloss Dagstuhl - Leibniz Center for Informatics