"Directed Self-Assembly Based Cut Mask Optimization for Unidirectional Design."

Jiaojiao Ou et al. (2015)

> Home

Details and statistics

DOI: 10.1145/2742060.2742114

access: closed

type: Conference or Workshop Paper

metadata version: 2018-11-06

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - conf/glvlsi/OuYGPPL15
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/glvlsi/OuYGPPL15
Jiaojiao Ou, Bei Yu, Jhih-Rong Gao, David Z. Pan, Moshe Preil, Azat Latypov:
Directed Self-Assembly Based Cut Mask Optimization for Unidirectional Design. ACM Great Lakes Symposium on VLSI 2015: 83-86

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.