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"Thin germanium dioxide film with a high quality interface formed in a ..."

Akira Wada et al. (2012)

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DOI: 10.1109/ESSDERC.2012.6343339

access: closed

type: Conference or Workshop Paper

metadata version: 2019-10-19

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  dblp key:
  - conf/essderc/WadaSZT12
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Akira Wada, Seiji Samukawa, Rui Zhang, Shinichi Takagi:
Thin germanium dioxide film with a high quality interface formed in a direct neutral beam oxidation process. ESSDERC 2012: 85-88

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