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"Model-based control for chemical-mechanical planarization (CMP)."

Dick de Roover, Abbas Emami-Naeini, Jon L. Ebert (2004)

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DOI: 10.23919/ACC.2004.1383922

access: closed

type: Conference or Workshop Paper

metadata version: 2022-11-24

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  - conf/amcc/RooverEE04
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Dick de Roover, Abbas Emami-Naeini, Jon L. Ebert:
Model-based control for chemical-mechanical planarization (CMP). ACC 2004: 3922-3929

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