BibTeX record journals/mr/AbermannESLOB07

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@article{DBLP:journals/mr/AbermannESLOB07,
  author       = {Stephan Abermann and
                  J. K. Efavi and
                  G. Sj{\"{o}}blom and
                  Max Christian Lemme and
                  J{\"{o}}rgen Olsson and
                  Emmerich Bertagnolli},
  title        = {Impact of Al-, Ni-, TiN-, and Mo-metal gates on MOCVD-grown HfO\({}_{\mbox{2}}\)
                  and ZrO\({}_{\mbox{2}}\) high-kappa dielectrics},
  journal      = {Microelectron. Reliab.},
  volume       = {47},
  number       = {4-5},
  pages        = {536--539},
  year         = {2007},
  url          = {https://doi.org/10.1016/j.microrel.2007.01.002},
  doi          = {10.1016/J.MICROREL.2007.01.002},
  timestamp    = {Mon, 17 Jun 2024 14:54:44 +0200},
  biburl       = {https://dblp.org/rec/journals/mr/AbermannESLOB07.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}