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Martin Bednarzik

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2000 – 2009

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2003
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Linke Jian, Bernd Loechel, Heinz-Ulrich Scheunemann, Martin Bednarzik, Yohannes M. Desta, Jost Goettert:
Fabrication of Ultra Thick, Ultra High Aspect Ratio Microcomponents by Deep and Ultra Deep X-Ray Lithography. ICMENS 2003: 10-14
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Martin Bednarzik, Heinz-Ulrich Scheunemann, Alexander Barth, Daniel Schondelmaier, Bernd Loechel:
First Results in Patterning of Ultra High Aspect Ratio Microstructures by a 4T Wave Length Shifter at BESSY. ICMENS 2003: 177-

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