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ORCIDGioele Mirabelli
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2020 – today
- 2024
[c7]S. Mishra, Bjorn Vermeersch, Sankatali Venkateswarlu, Halil Kukner, Gioele Mirabelli, Fabian M. Bufler, Moritz Brunion, Dawit Burusie Abdi, Herman Oprins, D. Biswas, Odysseas Zografos, Francky Catthoor, Pieter Weckx, Geert Hellings, James Myers, Julien Ryckaert:
Thermal Considerations for Block-Level PPA Assessment in Angstrom Era: A Comparison Study of Nanosheet FETs (A10) & Complementary FETs (A5). VLSI Technology and Circuits 2024: 1-2- 2023
- [c6]Devin Verreck, Piet Wambacq, Maarten Van De Put, Zubair Ahmed, Quentin Smets, Aryan Afzalian, Rutger Duflou, Xiangyu Wu, Gioele Mirabelli, Rongmei Chen, Inge Asselberghs, Gouri Sankar Kar:
The Promise of 2-D Materials for Scaled Digital and Analog Applications. ISSCC 2023: 394-395 - [c5]Giuliano Sisto, R. Preston, Rongmei Chen, Gioele Mirabelli, Anita Farokhnejad, Yun Zhou
, Ivan Ciofi, Anne Jourdain, A. Veloso, Michele Stucchi, Odysseas Zografos, Pieter Weckx, Geert Hellings, Julien Ryckaert:
Block-level Evaluation and Optimization of Backside PDN for High-Performance Computing at the A14 node. VLSI Technology and Circuits 2023: 1-2 - [c4]S. Yang, Pieter Schuddinck, Marie Garcia Bardon, Yang Xiang, Anabela Veloso, B. T. Chan, Gioele Mirabelli, Gaspard Hiblot, Geert Hellings, Julien Ryckaert:
PPA and Scaling Potential of Backside Power Options in N2 and A14 Nanosheet Technology. VLSI Technology and Circuits 2023: 1-2 - 2022
- [c3]Odysseas Zografos, Bilal Chehab, Pieter Schuddinck, Gioele Mirabelli, Naveen Kakarla, Yang Xiang, Pieter Weckx, Julien Ryckaert:
Design enablement of CFET devices for sub-2nm CMOS nodes. DATE 2022: 29-33 - [c2]Pieter Schuddinck, Fabian M. Bufler, Yang Xiang, Anita Farokhnejad, Gioele Mirabelli, Anne Vandooren, Bilal Chehab, A. Gupta, César Roda Neve, Geert Hellings, Julien Ryckaert:
PPAC of sheet-based CFET configurations for 4 track design with 16nm metal pitch. VLSI Technology and Circuits 2022: 365-366
2010 – 2019
- 2017
- [c1]Gioele Mirabelli, Farzan Gity, Scott Monaghan, Paul K. Hurley, Ray Duffy:
Impact of impurities, interface traps and contacts on MoS2 MOSFETs: Modelling and experiments. ESSDERC 2017: 288-291
Coauthor Index
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