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Gerard Luk-Pat

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Conference and Workshop Papers

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2013
[c2]
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Yuelin Du, Qiang Ma, Hua Song, James P. Shiely, Gerard Luk-Pat, Alexander Miloslavsky, Martin D. F. Wong:
Spacer-is-dielectric-compliant detailed routing for self-aligned double patterning lithography. DAC 2013: 93:1-93:6
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Bei Yu, Yen-Hung Lin, Gerard Luk-Pat, Duo Ding, Kevin Lucas, David Z. Pan:
A high-performance triple patterning layout decomposer with balanced density. ICCAD 2013: 163-169

Informal and Other Publications

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2014
[i1]
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Bei Yu, Yen-Hung Lin, Gerard Luk-Pat, Duo Ding, Kevin Lucas, David Z. Pan:
A High-Performance Triple Patterning Layout Decomposer with Balanced Density. CoRR abs/1402.2890 (2014)

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