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T. Gebel

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2002
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A. N. Nazarov, I. N. Osiyuk, V. S. Lysenko, T. Gebel, Lars Rebohle, W. Skorupa:
Charge trapping and degradation in Ge⁺ ion implanted SiO₂ layers during high-field electron injection. Microelectron. Reliab. 42(9-11): 1461-1464 (2002)

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