BibTeX record journals/mr/HayashiNW03

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@article{DBLP:journals/mr/HayashiNW03,
  author       = {Masashi Hayashi and
                  Shinji Nakano and
                  Tetsuaki Wada},
  title        = {Dependence of copper interconnect electromigration phenomenon on barrier
                  metal materials},
  journal      = {Microelectron. Reliab.},
  volume       = {43},
  number       = {9-11},
  pages        = {1545--1550},
  year         = {2003},
  url          = {https://doi.org/10.1016/S0026-2714(03)00273-7},
  doi          = {10.1016/S0026-2714(03)00273-7},
  timestamp    = {Sat, 22 Feb 2020 19:27:39 +0100},
  biburl       = {https://dblp.org/rec/journals/mr/HayashiNW03.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}

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