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BibTeX record journals/ieicetc/ShinTO23
@article{DBLP:journals/ieicetc/ShinTO23, author = {Joong{-}Won Shin and Masakazu Tanuma and Shun'ichiro Ohmi}, title = {Kr-Plasma Sputtering for Pt Gate Electrode Deposition on {MFSFET} with 5 nm-Thick Ferroelectric Nondoped HfO\({}_{\mbox{2}}\) Gate Insulator for Analog Memory Application}, journal = {{IEICE} Trans. Electron.}, volume = {106}, number = {10}, pages = {581--587}, year = {2023}, url = {https://doi.org/10.1587/transele.2022fup0003}, doi = {10.1587/TRANSELE.2022FUP0003}, timestamp = {Mon, 23 Oct 2023 15:35:37 +0200}, biburl = {https://dblp.org/rec/journals/ieicetc/ShinTO23.bib}, bibsource = {dblp computer science bibliography, https://dblp.org} }
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