BibTeX record journals/ieicetc/ShinTO23

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@article{DBLP:journals/ieicetc/ShinTO23,
  author       = {Joong{-}Won Shin and
                  Masakazu Tanuma and
                  Shun'ichiro Ohmi},
  title        = {Kr-Plasma Sputtering for Pt Gate Electrode Deposition on {MFSFET}
                  with 5 nm-Thick Ferroelectric Nondoped HfO\({}_{\mbox{2}}\) Gate Insulator
                  for Analog Memory Application},
  journal      = {{IEICE} Trans. Electron.},
  volume       = {106},
  number       = {10},
  pages        = {581--587},
  year         = {2023},
  url          = {https://doi.org/10.1587/transele.2022fup0003},
  doi          = {10.1587/TRANSELE.2022FUP0003},
  timestamp    = {Mon, 23 Oct 2023 15:35:37 +0200},
  biburl       = {https://dblp.org/rec/journals/ieicetc/ShinTO23.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}