BibTeX record journals/ieicet/OhYHKJHCKWL05

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@article{DBLP:journals/ieicet/OhYHKJHCKWL05,
  author       = {Soon{-}Young Oh and
                  Jang{-}Gn Yun and
                  Bin{-}Feng Huang and
                  Yong{-}Jin Kim and
                  Hee{-}Hwan Ji and
                  Sang{-}Bum Huh and
                  Han{-}Seob Cha and
                  Ui{-}Sik Kim and
                  Jin{-}Suk Wang and
                  Hi{-}Deok Lee},
  title        = {Thermally Robust Nickel Silicide Process for Nano-Scale {CMOS} Technology},
  journal      = {{IEICE} Trans. Electron.},
  volume       = {88-C},
  number       = {4},
  pages        = {651--655},
  year         = {2005},
  url          = {https://doi.org/10.1093/ietele/e88-c.4.651},
  doi          = {10.1093/IETELE/E88-C.4.651},
  timestamp    = {Sat, 11 Apr 2020 14:48:24 +0200},
  biburl       = {https://dblp.org/rec/journals/ieicet/OhYHKJHCKWL05.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}
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