BibTeX record journals/ibmrd/Ito01

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@article{DBLP:journals/ibmrd/Ito01,
  author       = {Hiroshi Ito},
  title        = {Dissolution behavior of chemically amplified resist polymers for 248-,
                  193-, and 157-nm lithography},
  journal      = {{IBM} J. Res. Dev.},
  volume       = {45},
  number       = {5},
  pages        = {683--696},
  year         = {2001},
  url          = {https://doi.org/10.1147/rd.455.0683},
  doi          = {10.1147/RD.455.0683},
  timestamp    = {Fri, 13 Mar 2020 10:54:56 +0100},
  biburl       = {https://dblp.org/rec/journals/ibmrd/Ito01.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}
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