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BibTeX record journals/ibmrd/Ito01
@article{DBLP:journals/ibmrd/Ito01, author = {Hiroshi Ito}, title = {Dissolution behavior of chemically amplified resist polymers for 248-, 193-, and 157-nm lithography}, journal = {{IBM} J. Res. Dev.}, volume = {45}, number = {5}, pages = {683--696}, year = {2001}, url = {https://doi.org/10.1147/rd.455.0683}, doi = {10.1147/RD.455.0683}, timestamp = {Fri, 13 Mar 2020 10:54:56 +0100}, biburl = {https://dblp.org/rec/journals/ibmrd/Ito01.bib}, bibsource = {dblp computer science bibliography, https://dblp.org} }
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