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"Dissolution behavior of chemically amplified resist polymers for 248-, ..."

Hiroshi Ito (2001)

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DOI: 10.1147/RD.455.0683

access: closed

type: Journal Article

metadata version: 2020-03-13

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Hiroshi Ito:
Dissolution behavior of chemically amplified resist polymers for 248-, 193-, and 157-nm lithography. IBM J. Res. Dev. 45(5): 683-696 (2001)

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