BibTeX record conf/irps/ViegasFAKHMCH22

• > Home > conf/irps/ViegasFAKHMCH22

@inproceedings{DBLP:conf/irps/ViegasFAKHMCH22,
  author       = {Alison Erlene Viegas and
                  Konstantinos Efstathios Falidas and
                  Tarek Nadi Ismail Ali and
                  Kati K{\"{u}}hnel and
                  Raik Hoffmann and
                  Clemens Mart and
                  Malte Czernohorsky and
                  Johannes Heitmann},
  title        = {Reliability of Ferroelectric and Antiferroelectric Si: HfO2 materials
                  in 3D capacitors by {TDDB} studies},
  booktitle    = {{IEEE} International Reliability Physics Symposium, {IRPS} 2022, Dallas,
                  TX, USA, March 27-31, 2022},
  pages        = {47--1},
  publisher    = {{IEEE}},
  year         = {2022},
  url          = {https://doi.org/10.1109/IRPS48227.2022.9764517},
  doi          = {10.1109/IRPS48227.2022.9764517},
  timestamp    = {Fri, 02 Aug 2024 09:02:15 +0200},
  biburl       = {https://dblp.org/rec/conf/irps/ViegasFAKHMCH22.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}