![](https://dblp.uni-trier.de/img/logo.ua.320x120.png)
![](https://dblp.uni-trier.de/img/dropdown.dark.16x16.png)
![](https://dblp.uni-trier.de/img/peace.dark.16x16.png)
Остановите войну!
for scientists:
![search dblp search dblp](https://dblp.uni-trier.de/img/search.dark.16x16.png)
![search dblp](https://dblp.uni-trier.de/img/search.dark.16x16.png)
default search action
"Reliability of Ferroelectric and Antiferroelectric Si: HfO2 materials in ..."
Alison Erlene Viegas et al. (2022)
- Alison Erlene Viegas, Konstantinos Efstathios Falidas
, Tarek Nadi Ismail Ali, Kati Kühnel, Raik Hoffmann, Clemens Mart, Malte Czernohorsky, Johannes Heitmann:
Reliability of Ferroelectric and Antiferroelectric Si: HfO2 materials in 3D capacitors by TDDB studies. IRPS 2022: 47-1
![](https://dblp.uni-trier.de/img/cog.dark.24x24.png)
manage site settings
To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.