BibTeX record conf/amcc/FlemingWGRN16

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@inproceedings{DBLP:conf/amcc/FlemingWGRN16,
  author       = {Andrew J. Fleming and
                  Adrian Wills and
                  Omid T. Ghalehbeygi and
                  Ben Routley and
                  Brett Ninness},
  title        = {A nonlinear programming approach to exposure optimization in scanning
                  laser lithography},
  booktitle    = {2016 American Control Conference, {ACC} 2016, Boston, MA, USA, July
                  6-8, 2016},
  pages        = {5811--5816},
  publisher    = {{IEEE}},
  year         = {2016},
  url          = {https://doi.org/10.1109/ACC.2016.7526580},
  doi          = {10.1109/ACC.2016.7526580},
  timestamp    = {Fri, 09 Apr 2021 18:47:59 +0200},
  biburl       = {https://dblp.org/rec/conf/amcc/FlemingWGRN16.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}
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