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"A nonlinear programming approach to exposure optimization in scanning ..."

Andrew J. Fleming et al. (2016)

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DOI: 10.1109/ACC.2016.7526580

access: closed

type: Conference or Workshop Paper

metadata version: 2021-04-09

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  - conf/amcc/FlemingWGRN16
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Andrew J. Fleming, Adrian Wills, Omid T. Ghalehbeygi, Ben Routley, Brett Ninness:
A nonlinear programming approach to exposure optimization in scanning laser lithography. ACC 2016: 5811-5816

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