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@inproceedings{DBLP:conf/drc/HellenbrandMSKL18,
  author       = {Markus Hellenbrand and
                  Elvedin Memisevic and
                  Johannes Svensson and
                  A. Krishnaraja and
                  Erik Lind and
                  Lars{-}Erik Wernersson},
  title        = {Effect of Gate Oxide Defects on Tunnel Transistor {RF} Performance},
  booktitle    = {76th Device Research Conference, {DRC} 2018, Santa Barbara, CA, USA,
                  June 24-27, 2018},
  pages        = {1--2},
  publisher    = {{IEEE}},
  year         = {2018},
  url          = {https://doi.org/10.1109/DRC.2018.8442145},
  doi          = {10.1109/DRC.2018.8442145},
  timestamp    = {Sun, 06 Oct 2024 01:00:00 +0200},
  biburl       = {https://dblp.org/rec/conf/drc/HellenbrandMSKL18.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}