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@inproceedings{DBLP:conf/drc/HellenbrandMSKL18, author = {Markus Hellenbrand and Elvedin Memisevic and Johannes Svensson and A. Krishnaraja and Erik Lind and Lars{-}Erik Wernersson}, title = {Effect of Gate Oxide Defects on Tunnel Transistor {RF} Performance}, booktitle = {76th Device Research Conference, {DRC} 2018, Santa Barbara, CA, USA, June 24-27, 2018}, pages = {1--2}, publisher = {{IEEE}}, year = {2018}, url = {https://doi.org/10.1109/DRC.2018.8442145}, doi = {10.1109/DRC.2018.8442145}, timestamp = {Sun, 06 Oct 2024 01:00:00 +0200}, biburl = {https://dblp.org/rec/conf/drc/HellenbrandMSKL18.bib}, bibsource = {dblp computer science bibliography, https://dblp.org} }
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