"Physics-Based Electromigration and Time Dependent Dielectric Breakdown ..."

Xin Huang (2016)

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type: Book or Thesis

metadata version: 2024-09-20

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Xin Huang:
Physics-Based Electromigration and Time Dependent Dielectric Breakdown Modeling and Reliability Analysis for Nanometer VLSI Circuits. University of California, Riverside, USA, 2016

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