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"Interface Roughness Effects in Ultra-Thin Tunneling Oxides."

D. Z.-Y. Ting, Erik S. Daniel, Thomas C. McGill (1998)

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DOI: 10.1155/1998/23567

access: open

type: Journal Article

metadata version: 2023-05-08

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  dblp key:
  - journals/vlsi/TingDM98
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  - https://dblp.org/rec/journals/vlsi/TingDM98
D. Z.-Y. Ting, Erik S. Daniel, Thomas C. McGill:
Interface Roughness Effects in Ultra-Thin Tunneling Oxides. VLSI Design 8(1-4): 47-51 (1998)

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