"Crosstalk-Induced Delay, Noise, and Interconnect Planarization ..."

Arthur Nieuwoudt, Jamil Kawa, Yehia Massoud (2010)

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DOI: 10.1109/TVLSI.2008.2010830

access: closed

type: Journal Article

metadata version: 2020-03-11

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Arthur Nieuwoudt, Jamil Kawa, Yehia Massoud:
Crosstalk-Induced Delay, Noise, and Interconnect Planarization Implications of Fill Metal in Nanoscale Process Technology. IEEE Trans. Very Large Scale Integr. Syst. 18(3): 378-391 (2010)

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