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"Gradient-Based Source and Mask Optimization in Optical Lithography."

Yao Peng et al. (2011)

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DOI: 10.1109/TIP.2011.2131668

access: closed

type: Journal Article

metadata version: 2022-10-13

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Yao Peng, Jinyu Zhang, Yan Wang, Zhiping Yu:
Gradient-Based Source and Mask Optimization in Optical Lithography. IEEE Trans. Image Process. 20(10): 2856-2864 (2011)

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