"Electrical Resistance/Capacitance Dual-Mode Tomography Based on ..."

Chao Tan et al. (2023)

> Home

Details and statistics

DOI: 10.1109/TIM.2023.3300419

access: closed

type: Journal Article

metadata version: 2023-08-31

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/tim/TanHLSD23
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/tim/TanHLSD23
Chao Tan, Shiyang Huang, Guanghui Liang, Marco José da Silva, Feng Dong:
Electrical Resistance/Capacitance Dual-Mode Tomography Based on Dual-Frequency Response. IEEE Trans. Instrum. Meas. 72: 1-11 (2023)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.