"Modeling of a plasma processing machine for semiconductor wafer etching ..."

Fathi M. A. Salam et al. (1997)

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DOI: 10.1109/87.641404

access: closed

type: Journal Article

metadata version: 2020-06-08

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  - https://dblp.org/rec/journals/tcst/SalamPEGA97
Fathi M. A. Salam, Christian Piwek, Gamze Erten, Timothy A. Grotjohn, Jes Asmussen:
Modeling of a plasma processing machine for semiconductor wafer etching using energy-functions-based neural networks. IEEE Trans. Control. Syst. Technol. 5(6): 598-613 (1997)

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