default search action
"Informational Lithography Approach Based on Source and Mask Optimization."
Xu Ma et al. (2021)
- Xu Ma, Yihua Pan, Shengen Zhang, Javier Garcia-Frías, Gonzalo R. Arce:
Informational Lithography Approach Based on Source and Mask Optimization. IEEE Trans. Computational Imaging 7: 32-42 (2021)
manage site settings
To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.