"Dummy-feature placement for chemical-mechanical polishinguniformity in a ..."

Ruiqi Tian, Xiaoping Tang, Martin D. F. Wong (2002)

> Home

Details and statistics

DOI: 10.1109/43.974138

access: closed

type: Journal Article

metadata version: 2022-10-02

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/tcad/TianTW02
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/tcad/TianTW02
Ruiqi Tian, Xiaoping Tang, Martin D. F. Wong:
Dummy-feature placement for chemical-mechanical polishinguniformity in a shallow-trench isolation process. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 21(1): 63-71 (2002)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.