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"DSA-Compliant Routing for 2-D Patterns Using Block Copolymer Lithography."

Yu-Hsuan Su, Yao-Wen Chang (2019)

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DOI: 10.1109/TCAD.2018.2812122

access: closed

type: Journal Article

metadata version: 2020-09-24

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Yu-Hsuan Su, Yao-Wen Chang:
DSA-Compliant Routing for 2-D Patterns Using Block Copolymer Lithography. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 38(2): 267-280 (2019)

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