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"Rigorous three-dimensional photoresist exposure and development simulation ..."

Heinrich Kirchauer, Siegfried Selberherr (1997)

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DOI: 10.1109/43.664225

access: closed

type: Journal Article

metadata version: 2020-09-24

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Heinrich Kirchauer, Siegfried Selberherr:
Rigorous three-dimensional photoresist exposure and development simulation over nonplanar topography. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 16(12): 1431-1438 (1997)

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