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"Laser-produced plasma light source for extreme ultraviolet lithography."

Harry Shields et al. (2002)

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DOI: 10.1109/JPROC.2002.803660

access: closed

type: Journal Article

metadata version: 2021-08-17

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  - https://dblp.org/rec/journals/pieee/ShieldsFPOMP02
Harry Shields, Steven W. Fornaca, Michael B. Petach, Rocco A. Orsini, Richard H. Moyer, Randall J. St Pierre:
Laser-produced plasma light source for extreme ultraviolet lithography. Proc. IEEE 90(10): 1689-1695 (2002)

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