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"Using advanced simulation to aid microlithography development."

Daniel C. Cole et al. (2001)

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DOI: 10.1109/5.940288

access: closed

type: Journal Article

metadata version: 2021-08-17

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Daniel C. Cole, Eytan Barouch, Edward W. Conrad, Michael Yeung:
Using advanced simulation to aid microlithography development. Proc. IEEE 89(8): 1194-1215 (2001)

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