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"Degradation kinetics of ultrathin HfO2 layers on Si(1 0 0) ..."

Andrei Zenkevich et al. (2007)

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DOI: 10.1016/J.MICROREL.2007.01.071

access: closed

type: Journal Article

metadata version: 2023-09-30

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Andrei Zenkevich, Yu. Lebedinskii, G. Scarel, Marco Fanciulli, Andrey Baturin, N. Lubovin:
Degradation kinetics of ultrathin HfO₂ layers on Si(1 0 0) during vacuum annealing monitored with in situ XPS/LEIS and ex situ AFM. Microelectron. Reliab. 47(4-5): 657-659 (2007)

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