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"The need for multi-scale approaches in Cu/low-k reliability issues."

Cadmus A. Yuan et al. (2008)

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DOI: 10.1016/J.MICROREL.2008.03.024

access: closed

type: Journal Article

metadata version: 2023-09-30

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Cadmus A. Yuan, Olaf van der Sluis, Willem D. van Driel, G. Q. (Kouchi) Zhang:
The need for multi-scale approaches in Cu/low-k reliability issues. Microelectron. Reliab. 48(6): 833-842 (2008)

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