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"The self-formatting barrier characteristics of Cu-Mg/SiO2 and ..."
Seol-Min Yi et al. (2008)
- Seol-Min Yi, Kwang-Ho Jang, Jung-Uk An, Sang-Soo Hwang, Young-Chang Joo:
The self-formatting barrier characteristics of Cu-Mg/SiO2 and Cu-Ru/SiO2 films for Cu interconnects. Microelectron. Reliab. 48(5): 744-748 (2008)
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